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Physics > Atomic Physics

arXiv:physics/0402127 (physics)
[Submitted on 26 Feb 2004 (v1), last revised 27 Feb 2004 (this version, v2)]

Title:Atom lithography with two-dimensional optical masks

Authors:S.J.H. Petra, K.A.H. van Leeuwen, L. Feenstra, W. Hogervorst, W. Vassen
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Abstract: With a two-dimensional (2D) optical mask, nanoscale patterns are created for the first time in an atom lithography process using metastable helium atoms. The internal energy of the atoms is used to locally damage a hydrofobic resist layer, which is removed in a wet etching process. Experiments have been performed with several polarizations for the optical mask, resulting in different intensity patterns, and corresponding nanoscale structures. The results for a linear polarized light field show an array of holes with a diameter of 260 nm, in agreement with a computed pattern. With a circularly polarized light field a line pattern is observed with a spacing of 766 nm. Simulations taking into account many possible experimental imperfections can not explain this pattern.
Comments: 5 pages, 4 figures
Subjects: Atomic Physics (physics.atom-ph)
Cite as: arXiv:physics/0402127 [physics.atom-ph]
  (or arXiv:physics/0402127v2 [physics.atom-ph] for this version)
  https://doi.org/10.48550/arXiv.physics/0402127
Journal reference: Appl. Phys. B 79 (3), 279-283 (2004)
Related DOI: https://doi.org/10.1007/s00340-004-1569-4

Submission history

From: S. J. H. Petra [view email]
[v1] Thu, 26 Feb 2004 17:37:41 UTC (202 KB)
[v2] Fri, 27 Feb 2004 13:03:16 UTC (202 KB)
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