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Condensed Matter > Materials Science

arXiv:cond-mat/9804155 (cond-mat)
[Submitted on 15 Apr 1998]

Title:Initial stages of thin film growth in the presence of island-edge barriers

Authors:Daniel Kandel
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Abstract: A model of submonolayer thin film growth is studied, where the attachment of atoms to island edges is hindered by an energy barrier. A novel behavior of the density of islands, N_s, is predicted as a function of flux F and temperature T. For example, N_s scales as F^X with X=2i^*/(i^*+3), where i^* is the critical island size, in contrast with the standard result X=i^*/(i^*+2). The theory is applicable to surfactant mediated growth and chemical vapor deposition. It explains recent experiments, which are inconsistent with the standard theory.
Subjects: Materials Science (cond-mat.mtrl-sci); Statistical Mechanics (cond-mat.stat-mech)
Cite as: arXiv:cond-mat/9804155 [cond-mat.mtrl-sci]
  (or arXiv:cond-mat/9804155v1 [cond-mat.mtrl-sci] for this version)
  https://doi.org/10.48550/arXiv.cond-mat/9804155
Journal reference: Phys Rev Lett 78, 499 (1997)
Related DOI: https://doi.org/10.1103/PhysRevLett.78.499

Submission history

From: Daniel Kandel [view email]
[v1] Wed, 15 Apr 1998 11:21:17 UTC (8 KB)
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