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Condensed Matter > Materials Science

arXiv:2411.02676 (cond-mat)
[Submitted on 4 Nov 2024]

Title:One-step synthesis of graphene containing topological defects

Authors:Benedikt P. Klein, Matthew A. Stoodley, Joel Deyerling, Luke A. Rochford, Dylan B. Morgan, David Hopkinson, Sam Sullivan-Allsop, Fulden Eratam, Lars Sattler, Sebastian M. Weber, Gerhard Hilt, Alexander Generalov, Alexei Preobrajenski, Thomas Liddy, Leon B. S. Williams, Tien-Lin Lee, Alex Saywell, Roman Gorbachev, Sarah J. Haigh, Christopher Allen, Willi Auwärter, Reinhard J. Maurer, David A. Duncan
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Abstract:Chemical vapour deposition enables large-domain growth of ideal graphene, yet many applications of graphene require the controlled inclusion of specific defects. We present a one-step chemical vapour deposition procedure aimed at retaining the precursor topology when incorporated into the grown carbonaceous film. When azupyrene, the molecular analogue of the Stone-Wales defect in graphene, is used as a precursor, carbonaceous monolayers with a range of morphologies are produced as a function of the copper substrate growth temperature. The higher the substrate temperature during deposition, the closer the resulting monolayer is to ideal graphene. Analysis, with a set of complementary materials characterisation techniques, reveals morphological changes closely correlated with changes in the atomic adsorption heights, network topology, and concentration of 5-/7-membered carbon rings. The engineered defective carbon monolayers can be transferred to different substrates, potentially enabling applications in nanoelectronics, sensorics, and catalysis.
Comments: manuscript and SI provided
Subjects: Materials Science (cond-mat.mtrl-sci); Mesoscale and Nanoscale Physics (cond-mat.mes-hall)
Cite as: arXiv:2411.02676 [cond-mat.mtrl-sci]
  (or arXiv:2411.02676v1 [cond-mat.mtrl-sci] for this version)
  https://doi.org/10.48550/arXiv.2411.02676

Submission history

From: Reinhard Maurer [view email]
[v1] Mon, 4 Nov 2024 23:25:50 UTC (3,786 KB)
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