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Physics > Plasma Physics

arXiv:2106.09944 (physics)
[Submitted on 18 Jun 2021]

Title:Miniature Plasma Source for In-Situ Scanner Cleaning

Authors:Mark van de Kerkhof, Edgar Osorio, Vladimir Krivtsun, Maxim Spiridonov, Viacheslav Medvedev, Dmitry Astakhov
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Abstract:EUV Lithography is the technology of choice for High-Volume Manufacturing (HVM) of sub-10nm lithography. One of the challenges is to enable in-situ cleaning of functional surfaces such as sensors, fiducials and interferometer mirrors without opening the scanner tool. Thermally created hydrogen radicals have been successfully used for this purpose. These sources have a limited cleaning speed and relatively high thermal load to the surface being cleaned. Here we present an alternative plasma-based technique to simultaneously create hydrogen radicals and hydrogen ions. This results in significantly improved cleaning speed while simultaneously reducing the overall thermal load. As an additional benefit, this plasma source has a minimized and flexible building volume to allow easy integration into various locations in the EUV lithographic scanner.
Subjects: Plasma Physics (physics.plasm-ph)
Cite as: arXiv:2106.09944 [physics.plasm-ph]
  (or arXiv:2106.09944v1 [physics.plasm-ph] for this version)
  https://doi.org/10.48550/arXiv.2106.09944

Submission history

From: Mark van de Kerkhof [view email]
[v1] Fri, 18 Jun 2021 06:49:21 UTC (571 KB)
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