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Physics > Instrumentation and Detectors

arXiv:2004.02571 (physics)
[Submitted on 6 Apr 2020 (v1), last revised 16 Nov 2020 (this version, v2)]

Title:Alpha spectrometric characterization of thin $^{233}$U sources for $^{229\text{(m)}}$Th production

Authors:Raphael Haas, Michelle Hufnagel, Roman Abrosimov, Christoph E. Düllmann, Dominik Krupp, Christoph Mokry, Dennis Renisch, Jörg Runke, Ulrich W. Scherer
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Abstract:Four different techniques were applied for the production of $^{233}$U alpha recoil ion sources, providing $^{229}$Th ions. They were compared with respect to a minimum energy spread of the $^{229}$Th recoil ions, using the emitted alpha particles as an indicator. The techniques of Molecular Plating, Drop-on-Demand inkjet printing, chelation from dilute nitric acid solution on chemically functionalized silicon surfaces, and self-adsorption on passivated titanium surfaces were used. All fabricated sources were characterized by using alpha spectrometry, radiographic imaging, and scanning electron microscopy. A direct validation for the estimated recoil ion rate was obtained by collecting $^{228}$Th recoil ions from $^{232}$U recoil ion sources prepared by self-adsorption and Molecular Plating. The chelation and the self-adsorption based approaches appear most promising for the preparation of recoil ion sources delivering monochromatic recoil ions.
Comments: 20 pages, 14 figures, 11 tables, ahead of print at Radiochim. Acta (2020)
Subjects: Instrumentation and Detectors (physics.ins-det); Nuclear Experiment (nucl-ex)
Cite as: arXiv:2004.02571 [physics.ins-det]
  (or arXiv:2004.02571v2 [physics.ins-det] for this version)
  https://doi.org/10.48550/arXiv.2004.02571
Journal reference: Radiochimica Acta (2020) ahead of print
Related DOI: https://doi.org/10.1515/ract-2020-0032

Submission history

From: Raphael Haas [view email]
[v1] Mon, 6 Apr 2020 11:38:41 UTC (22,069 KB)
[v2] Mon, 16 Nov 2020 08:43:56 UTC (8,671 KB)
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