Title:Nanoscale Organization of Block Copolymers at Surfaces: Comparison of Theory and Experiments

Abstract:We present both experiments and modeling of thin films of block copolymers (BCP) under the influence of specific surface nano-patterning and, in particular, address the conditions for BCP lamellae to orient perpendicular to the surfaces. One of the main motivations is to induce in-plane ordering of perpendicularly oriented BCP lamellae via surface features that are spaced out at distances much larger than the natural lamellar periodicity. The experiments are carried out on two separate set-ups. In the first one, scanning probe oxidation is used to chemically pattern silicon wafer covered with a self-assembled monolayer. The overall surface neutrality induces a perpendicular orientation while the chemical stripes enhance the in-plane alignment of the BCP lamellae. In the second set-up, NanoImprint lithography is used in an even superior fashion to align perpendicularly lamellar phases, within a range of system parameters. The modeling relies on self-consistent field calculations done in two-dimensions. We get a good agreement with experiments, especially for the NanoImprint lithography set-ups. In general, we find that in both set-ups there is an enhanced tendency to orient the BCP perpendicular to the substrate at thermodynamical equilibrium, as compared with films deposited on uniform and planar surfaces. However, we equally observe that the calculations are quite sensitive to the film initial conditions and sample history.