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Condensed Matter > Materials Science

arXiv:1710.07202 (cond-mat)
[Submitted on 19 Oct 2017 (v1), last revised 20 Oct 2017 (this version, v2)]

Title:Boron films produced by high energy Pulsed Laser Deposition

Authors:David Dellasega, Valeria Russo, Andrea Pezzoli, Claudia Conti, Nora Lecis, Edoardo Besozzi, Marco Beghi, Carlo E. Bottani, Matteo Passoni
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Abstract:Micron-thick boron films have been deposited by Pulsed Laser Deposition in vacuum on several substrates at room temperature. The use of high energy pulses (>700 mJ) results in the deposition of smooth coatings with low oxygen uptake even at base pressures of 10$^{-4}$ - 10$^{-3}$ Pa. A detailed structural analysis, by X-Ray Diffraction and Raman, allowed to assess the amorphous nature of the deposited films as well as to determine the base pressure that prevents boron oxide formation. In addition the crystallization dynamics has been characterized showing that film crystallinity already improves at relatively low temperatures (800 °C). Elastic properties of the boron films have been determined by Brillouin spectroscopy. Finally, micro-hardness tests have been used to explore cohesion and hardness of B films deposited on aluminum, silicon and alumina. The reported deposition strategy allows the growth of reliable boron coatings paving the way for their use in many technology fields.
Comments: The research leading to these results has also received funding from the European Research Council Consolidator Grant ENSURE (ERC-2014-CoG No. 647554)
Subjects: Materials Science (cond-mat.mtrl-sci)
Cite as: arXiv:1710.07202 [cond-mat.mtrl-sci]
  (or arXiv:1710.07202v2 [cond-mat.mtrl-sci] for this version)
  https://doi.org/10.48550/arXiv.1710.07202
Journal reference: Materials & Design, Volume 134, 15 November 2017, Pages 35-43
Related DOI: https://doi.org/10.1016/j.matdes.2017.08.025

Submission history

From: David Dellasega PhD [view email]
[v1] Thu, 19 Oct 2017 15:50:22 UTC (1,422 KB)
[v2] Fri, 20 Oct 2017 08:16:58 UTC (2,024 KB)
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