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Physics > Optics

arXiv:1405.1224 (physics)
[Submitted on 6 May 2014]

Title:Dispersion engineering of high-Q silicon microresonators via thermal oxidation

Authors:Wei C. Jiang, Jidong Zhang, Nicholas G. Usechak, Qiang Lin
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Abstract:We propose and demonstrate a convenient and sensitive technique for precise engineering of group-velocity dispersion in high-Q silicon microresonators. By accurately controlling the surface-oxidation thickness of silicon microdisk resonators, we are able to precisely manage the zero-dispersion wavelength while simultaneously further improving the high optical quality of our devices, with the optical Q close to a million. The demonstrated dispersion management allows us to achieve parametric generation with precisely engineerable emission wavelengths, which shows great potential for application in integrated silicon nonlinear and quantum photonics.
Subjects: Optics (physics.optics)
Cite as: arXiv:1405.1224 [physics.optics]
  (or arXiv:1405.1224v1 [physics.optics] for this version)
  https://doi.org/10.48550/arXiv.1405.1224
Related DOI: https://doi.org/10.1063/1.4890986

Submission history

From: Qiang Lin [view email]
[v1] Tue, 6 May 2014 10:54:56 UTC (584 KB)
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