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Condensed Matter > Materials Science

arXiv:1202.1560 (cond-mat)
[Submitted on 7 Feb 2012 (v1), last revised 27 Feb 2012 (this version, v2)]

Title:Electrical activation and electron spin resonance measurements of implanted bismuth in isotopically enriched silicon-28

Authors:C. D. Weis, C. C. Lo, V. Lang, A. M. Tyryshkin, R. E. George, K. M. Yu, J. Bokor, S. A. Lyon, J. J. L. Morton, T. Schenkel
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Abstract:We have performed continuous wave and pulsed electron spin resonance measurements of implanted bismuth donors in isotopically enriched silicon-28. Donors are electrically activated via thermal annealing with minimal diffusion. Damage from bismuth ion implantation is repaired during thermal annealing as evidenced by narrow spin resonance linewidths (B_pp=12uT and long spin coherence times T_2=0.7ms, at temperature T=8K). The results qualify ion implanted bismuth as a promising candidate for spin qubit integration in silicon.
Comments: 4 pages, 4 figures
Subjects: Materials Science (cond-mat.mtrl-sci)
Cite as: arXiv:1202.1560 [cond-mat.mtrl-sci]
  (or arXiv:1202.1560v2 [cond-mat.mtrl-sci] for this version)
  https://doi.org/10.48550/arXiv.1202.1560
Related DOI: https://doi.org/10.1063/1.4704561

Submission history

From: Christoph Weis [view email]
[v1] Tue, 7 Feb 2012 23:22:33 UTC (106 KB)
[v2] Mon, 27 Feb 2012 04:47:14 UTC (106 KB)
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