Quantum Physics
[Submitted on 13 Jun 2008 (v1), last revised 19 Aug 2008 (this version, v2)]
Title:Quantum Lithography Based on Multiple Light Exposures for Arbitrary Sub-Diffraction-Limit Pattern Generation
View PDFAbstract: We propose a super-resolution quantum lithography scheme based on coherent population trapping in lambda-type atoms coupled to temporally-cascaded standing-wave driving fields. By realizing effective multiplication of optical intensity profiles on an atomic state density distribution, the scheme enables an arbitrarily high degree of resolution enhancement without modifying the atomic level structure of the photographic medium or the light source configuration. It is also shown that the visibility of the super-resolution patterns is preserved under a significant atomic state decoherence rate.
Submission history
From: Hee Su Park Dr [view email][v1] Fri, 13 Jun 2008 02:08:26 UTC (178 KB)
[v2] Tue, 19 Aug 2008 01:41:45 UTC (963 KB)
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